Method for manufacturing liquid discharge head

ABSTRACT

A method for manufacturing a liquid discharge head includes a transferring step of transferring a dry film supported by a supporting member to a substrate having a hole, and a peeling step of peeling the supporting member off the dry film on the substrate. In the peeling step, the dry film is in contact with a wall surface defining the hole in the substrate.

The present application is a continuation of U.S. patent applicationSer. No. 14/553,978, filed on Nov. 25, 2014, which claims priority fromJapanese Patent Applications No. 2013-248449 filed Nov. 29, 2013 and No.2013-248450 filed Nov. 29, 2013, all of which are hereby incorporated byreference herein in their entirety.

BACKGROUND OF THE INVENTION Field of the Invention

The present invention relates to a method for manufacturing a liquiddischarge head.

Description of the Related Art

A liquid discharge head is used in a liquid discharge apparatus, such asan inkjet recording apparatus. The liquid discharge head includes aflow-passage forming member and a substrate. The flow-passage formingmember is disposed on the substrate and may form discharge ports as wellas liquid flow passages. The substrate has a liquid supply port. Aliquid supplied from the liquid supply port into the liquid flowpassages is discharged from the discharge ports onto a recording medium,such as paper.

As part of a method for manufacturing such a liquid discharge head,Japanese Patent Laid-Open No. 2006-137065 describes a method for forminga flow-passage forming member from a dry film transferred to asubstrate. Before being transferred, the dry film is supported by asupporting member. After the dry film is transferred, the supportingmember is peeled off the dry film. The flow-passage forming member isformed by leaving the dry film on the substrate and patterning the dryfilm using photolithography or the like.

SUMMARY OF THE INVENTION

A method for manufacturing a liquid discharge head according to anaspect of the present invention includes a transferring step oftransferring a dry film supported by a supporting member to a substratehaving a hole, and a peeling step of peeling the supporting member offthe dry film on the substrate. In the peeling step, the dry film is incontact with a wall surface defining the hole in the substrate.

Further features of the present invention will become apparent from thefollowing description of exemplary embodiments with reference to theattached drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 illustrates a liquid discharge head manufactured in the presentinvention.

FIGS. 2A to 2G illustrate a method for manufacturing a liquid dischargehead according to the present invention.

FIGS. 3A to 3E illustrate another method for manufacturing a liquiddischarge head according to the present invention.

FIGS. 4A to 4H illustrate another method for manufacturing a liquiddischarge head according to the present invention.

FIGS. 5A and 5B illustrate another liquid discharge head manufactured inthe present invention.

DESCRIPTION OF THE EMBODIMENTS

The substrate has a liquid supply port. To form the liquid supply portafter the flow-passage forming member is formed on the substrate, it isnecessary to protect the flow-passage forming member in the step offorming the liquid supply port. To avoid this, a hole to serve as theliquid supply port may be formed in the substrate before theflow-passage forming member is formed on the substrate.

However, studies done by the present inventors found that, in the stepof peeling the supporting member off the dry film, the dry film wassometimes pulled toward the supporting member and deformed (damaged). Inparticular, there was a tendency for the dry film to deform above thehole, that is, above the opening of the hole in the surface of thesubstrate. When the flow-passage forming member is formed by the dryfilm, deformation of the dry film leads to deformation of theflow-passage forming member. This makes it difficult to manufacture aliquid discharge head having a good shape. The dry film may be used as amold member for forming liquid flow passages. In this case, however,deformation of the dry film leads to deformation of the liquid flowpassages. Again, this makes it difficult to manufacture a liquiddischarge head having a good shape. The present invention provides amethod for manufacturing a liquid discharge head having a good shape.

After a dry film supported by a supporting member is transferred to asubstrate having a hole, the supporting member is peeled off the dryfilm. This method reduces deformation of the dry film caused by peelingoff the supporting member.

FIG. 1 illustrates a liquid discharge head manufactured according to anembodiment of the present invention. The liquid discharge head includesa substrate 4 and a flow-passage forming member 16. The substrate 4 ismade of silicon or the like. A front (or upper as shown in FIG. 1)surface of the substrate 4 is defined as a first surface. Energygenerating elements 5 are disposed on the first surface of the substrate4. The first surface of the substrate 4 may be a surface with a crystalorientation of (100). In other words, the substrate 4 may be a silicon(100) substrate. Examples of the energy generating elements 5 includeheating resistors and piezoelectric elements. The energy generatingelements 5 may be fully in contact with the first surface of thesubstrate 4, or may each have a hollow therein to be partially incontact with the first surface of the substrate 4. Bumps 15 are alsodisposed on the first surface of the substrate 4. The energy generatingelements 5 are driven by power supplied from outside the substrate 4through the bumps 15. The substrate 4 has a hole 14 serving as a liquidsupply port. The hole 14 passes through the substrate 4 from the firstsurface to a second surface which is opposite the first surface. Aliquid supplied through the hole 14 receives energy from the drivenenergy generating elements 5 and is discharged from liquid dischargeports 13 in the flow-passage forming member 16.

A method for manufacturing a liquid discharge head according to thepresent invention will now be described. FIGS. 2A to 2G arecross-sectional views corresponding to line II-II in the liquiddischarge head of FIG. 1.

First, as illustrated in FIG. 2A, the substrate 4 having the energygenerating elements 5 on the first surface is prepared. The energygenerating elements 5 are covered with a protective film 3 made of SiN,SiO₂, or the like. The substrate 4 has the hole 14 open to the firstsurface. The hole 14 illustrated in FIGS. 2A to 2G is a liquid supplyport. Although the hole 14 shown in FIG. 2A is a through hole passingthrough the substrate 4 from the first surface to the second surface,the hole 14 does not necessarily need to be a through hole. However, soas not to create an enclosed space in the process of manufacture, thehole 14 may be formed as a through hole. The hole 14 may be formed, forexample, by laser processing, reactive ion etching, sandblasting, or wetetching. FIG. 2A shows an example in which the substrate 4 is a silicon(100) substrate and the hole 14 is formed by wet etching usingtetramethylammonium hydroxide (TMAH). When the silicon (100) substrateis etched with an alkaline solution, such as a TMAH or potassiumhydroxide (KOH) solution, a tapered hole, such as that illustrated inFIG. 2A, can be formed by anisotropic etching. With a tapered hole, itis possible to particularly effectively reduce deformation of a dry filmin the step of peeling off a supporting member. The hole 14 may be atapered hole whose cross section parallel to the first surface widens inthe direction from the first surface to the second surface.

Next, as illustrated in FIG. 2B, a dry film 2 supported by a supportingmember 1 is prepared. Examples of the supporting member 1 include afilm, a glass member, and a silicon member. For convenience of peelingoff the supporting member 1 in a later step, a film may be used as thesupporting member 1. For example, a polyethylene terephthalate (PET)film, a polyimide film, a polyamide film, or a polyaramide film may beused as the supporting member 1. To facilitate peeling of the supportingmember 1 off the dry film 2, mold release treatment may be applied tothe surface of the supporting member 1.

The dry film 2 is obtained by shaping a resin into a film. The resinthat forms the dry film 2 may be a photosensitive resin. The softeningpoint of the resin may be from 40° C. to 120° C. The resin may be onethat is readily dissolved in an organic solvent. Examples of such aresin include an epoxy resin, an acrylic resin, and a urethane resin.The epoxy resin may be a bisphenol A type epoxy resin, a cresol novolacepoxy resin, or an alicyclic epoxy resin. The acrylic resin may bepolymethyl metacrylate. The urethane resin may be polyurethane. Examplesof the solvent for dissolving these resins include propylene glycolmethyl ether acetate (PGMEA), cyclohexanone, methyl ethyl ketone, andxylene. The viscosity of a resin composition obtained by dissolving aresin in such a solvent may be from 0.005 Pa·s to 0.15 Pa·s. The dryfilm 2 is formed on the supporting member 1 by applying the resincomposition thereto using a spin coating or slit coating technique anddrying the applied resin composition, for example, at 50° C. or more.After being dried, the dry film 2 on the supporting member 1 may be from5 μm to 30 μm thick.

After the dry film 2 supported by the supporting member 1 is prepared,the dry film 2 is transferred to the substrate 4 having the hole 14 asillustrated in FIG. 2C. The hole 14 is closed by the transferred dryfilm 2. In other words, the dry film 2 becomes a lid for the hole 14.The dry film 2 is brought into contact with a wall surface 14′ thatdefines the hole 14 in the substrate 4. To bring the dry film 2 intocontact with the wall surface 14′, for example, the dry film 2 may beheated while being in contact with the substrate 4. The heatingtemperature may be higher than the softening point of the dry film 2.Another method for bringing the dry film 2 into contact with the wallsurface 14′ may be to apply pressure to deform the dry film 2 in thedirection of the substrate 4 while the dry film 2 is in contact with thesubstrate 4. For discharge of air bubbles, the application of pressurein the direction of the substrate 4 may be done by roll-type transfer orby transfer under vacuum. Heat and pressure may be simultaneouslyapplied to the dry film 2. With such a method, the dry film 2 ispartially sunk into the hole 14 and brought into contact with the wallsurface 14′ as illustrated in FIG. 2C.

After the dry film 2 is contacted with the wall surface 14′ (in otherwords once the dry film is in contact with the wall surface 14′), apeeling step of peeling the supporting member 1 off the dry film 2 isperformed. As described above, the dry film 2 partially sinks in thehole 14 and is in contact with the wall surface 14′. Therefore, when thesupporting member 1 is peeled off, the dry film 2 is caught and held inthe hole 14 in the substrate 4. This makes the dry film 2 resistant todeformation.

When the dry film 2 is in contact with the wall surface 14′, the dryfilm 2 is thicker in a region (B) including a portion sinking in thehole 14 (i.e., in the region (B) above the hole 14) than in otherregions, such as a region (C) above the substrate 4 (in other words thedry film 2 is thicker in a region extending across the upper opening ofthe hole 14, and in particular extending across the narrowest portion ofthe upper opening hole, than in a region extending across the substrate4). The dry film 2 is preferably from 5 μm to 30 μm thick in the region(B) above the hole 14. When the dry film 2 is 5 μm thick or more in theregion (B), the dry film 2 can be suitably contacted with (in contactwith) the wall surface 14′. This makes it possible to reduce deformationof the dry film 2 when the supporting member 1 is peeled off. Morepreferably, the dry film 2 is 10 μm thick or more in the region (B). Inthe dry film 2, the thickness of the region (C) above the substrate 4becomes the height of flow passages. Therefore, the dry film 2 ispreferably from 3 μm to 25 μm thick, and more preferably 20 μm thick orless in the region (C). The dry film 2 enters the hole 14 preferably by2 μm or more, and more preferably by 5 μm or more, from the surface ofthe substrate 4. A length of a part which is in the hole of the dry film2 is preferably 25 μm or less, and more preferably 20 μm or less. Notethat the thicknesses and the lengths described here are those in thedirection perpendicular to the surface of the substrate 4.

Next, a flow passage pattern is formed in the dry film 2. To ensure anaccurate positional relationship between the liquid discharge ports 13and the energy generating elements 5, the flow passage pattern may beformed by photolithography as illustrated in FIG. 2D. Here, the dry film2 is irradiated with light through a mask 6 so as to form a flow passagepattern. An exposed region 8 and a non-exposed region 7 are formed inthe dry film 2. When the dry film 2 is made of negative photosensitiveresin, the exposed region 8 becomes part of the flow-passage formingmember 16 and the non-exposed region 7 becomes part of liquid flowpassages 10.

Next, as illustrated in FIG. 2E, a member 9 is formed on the dry film 2having the flow passage pattern. FIG. 2E shows an example in which asecond dry film different from the dry film 2 (hereinafter referred toas a first dry film) is used as the member 9. The second dry film issupported by the supporting member 1, which is peeled off after thesecond dry film is transferred onto the first dry film. The member 9 canalternatively be formed, for example, by applying a liquid resincomposition onto the first dry film and drying it. The member 9 isformed on the first dry film by coating using a spin coating or slitcoating technique, or by transfer using a lamination or press technique.

Next, as illustrated in FIG. 2F, a region for forming the liquiddischarge ports 13 is formed in the member 9. When the member 9 is madeof negative photosensitive resin, the member 9 is exposed to lightthrough the mask 6 as illustrated in FIG. 2F. Alternatively, laser orreactive ion etching may be used to form the liquid discharge ports 13in the member 9.

Next, as illustrated in FIG. 2G, development is performed by immersingthe dry film 2 and the member 9 in a developing solution such thatnon-exposed regions 7 are removed. The liquid flow passages 10 and theliquid discharge ports 13 are thus obtained. Examples of the developingsolution include PGMEA, tetrahydrofuran, cyclohexanone, methyl ethylketone, and xylene. The liquid flow passages 10 are defined by a member11 formed by the dry film 2. The liquid discharge ports 13 are definedby a member 19 formed by the member 9. The member 11 and the member 19form the flow-passage forming member 16 illustrated in FIG. 1. A wall 12extends from the member 19 to the liquid flow passages 10. The wall 12is formed by the dry film 2.

Last, electrical connections are made to form a liquid discharge head.The liquid discharge head manufactured in the present invention has agood shape with little deformation, because the dry film 2 forming theflow-passage forming member 16 is resistant to deformation. Asillustrated in FIG. 2G, the wall 12 may extend out to the liquid flowpassages 10. Specifically, the wall 12 can extend from the surface ofthe substrate 4 toward a liquid supply port by an amount by which thedry film 2 sinks into the hole 14.

The substrate 4 is exposed at the opening of the hole 14 serving as aliquid supply port. In this case, depending on the type of the liquid(ink) to be used, the substrate 4 exposed at the opening of the hole 14gradually dissolves. As a result, the energy generating elements 5 onthe substrate 4 may be eroded by contact with the liquid, or a circuitmay be shorted. This can be reduced by sinking the dry film 2 into thehole 14 while leaving part of the dry film 2 in place.

This will be explained with reference to FIGS. 4A to 4H. First, thesteps in FIGS. 4A to 4C are performed in the same manner as in FIGS. 2Ato 2C (so the description thereof will not be repeated). Next, the dryfilm 2 is patterned as illustrated in FIG. 4D. The patterning can bedone by photolithography or dry etching. For better accuracy, thepatterning may be preferably done by photolithography. FIG. 4D shows anexample in which the dry film 2 is exposed to light by photolithography.The dry film 2 is irradiated with light through the mask 6 to form theexposed region 8 and the non-exposed region 7 in the dry film 2. This isdone such that part of the dry film 2 covering the opening of the hole14 is left. That is, when the dry film 2 is made of negativephotosensitive resin, a part of the dry film 2 covering the opening ofthe hole 14 is made into the exposed region 8 as illustrated in FIG. 4D.The hole 14 is closed if the dry film 2 is fully exposed to light abovethe hole 14. Therefore, a part of the dry film 2 covering the edge ofthe opening is made into the exposed region 8 and the other region ismade into the non-exposed region 7. Any other part of the dry film 2,other than that above the hole 14, may also be exposed to light asnecessary. The dry film 2 is developed with a developing solution toremove the non-exposed region 7.

Next, as illustrated in FIG. 4E, the member 9 is formed on the remainingregion of the dry film 2, that is, on the exposed region 8. FIG. 4Eshows an example in which a second dry film different from the dry film2 (hereinafter referred to as a first dry film) is used as the member 9.The second dry film is supported by the supporting member 1, which ispeeled off after the second dry film is transferred onto the first dryfilm. The member 9 can alternatively be formed, for example, by applyinga liquid resin composition onto the first dry film and drying it. Themember 9 is formed on the first dry film by coating using a spin coatingor slit coating technique, or by transfer using a lamination or presstechnique.

Next, as illustrated in FIG. 4F, the member 9 is patterned. For example,the exposed region 8 and the non-exposed region 7 are formed in themember 9 by photolithography using the mask 6. The first dry film andthe second dry film have different sensitivities to light for exposure,and have different photosensitive wavelengths.

Next, as illustrated in FIG. 4G, a member for forming the liquiddischarge ports 13 is formed, and a region for forming the liquiddischarge ports 13 is formed in this member. When the member for formingthe liquid discharge ports 13 is made of negative photosensitive resin,the member is exposed to light through the mask 6. Alternatively, laseror reactive ion etching may be used to form the liquid discharge ports13.

Next, as illustrated in FIG. 4H, development is performed by immersionin a developing solution. The liquid flow passages 10 and the liquiddischarge ports 13 are thus obtained. Examples of the developingsolution include PGMEA, tetrahydrofuran, cyclohexanone, methyl ethylketone, and xylene.

Last, electrical connections are made to form a liquid discharge head.In the liquid discharge head manufactured in the present invention, thesubstrate 4 is protected at the opening of the hole 14 by a protectivefilm 20 formed by the dry film 2. The protective film 20 can be obtainedby forming the dry film 2 into a film extending from the surface of thesubstrate 4 to the wall surface 14′ that defines the hole 14. Theprotective film 20 thus protects the substrate 4 from liquid erosion.This makes it possible to provide a liquid discharge head having highreliability.

By patterning the dry film 2 illustrated in FIG. 4D, a filter 21 inFIGS. 5A and 5B can be obtained. FIG. 5A is a cross-sectional view of aliquid discharge head taken at the same position as FIGS. 4A to 4H. FIG.5B is a top view of the liquid discharge head illustrated in FIG. 5A.The filter 21 protects the opening of the hole 14 to serve also as aprotective film. The filter 21 can be formed by patterning the dry film2 to leave a portion to serve both as a protective film and a filter.

EXAMPLES

Specific examples of embodiments of the present invention will now begiven.

Example 1

First, as illustrated in FIG. 2A, the substrate 4 was prepared, whichhas the energy generating elements 5 made of TaSiN on the first surface.A silicon (100) substrate was used as the substrate 4. The substrate 4has the protective film 3 made of SiN. The hole 14 to serve as a liquidsupply port was formed in advance in the substrate 4 with 22% by mass oftetramethylammonium hydroxide (TMAH). The hole 14 formed was a taperedthrough hole.

Next, as illustrated in FIG. 2B, the supporting member 1 and the dryfilm 2 supported by the supporting member 1 were prepared. A PET filmwas used as the supporting member 1. The dry film 2 was formed byapplying a solution obtained by dissolving an epoxy resin (product name:N-695, manufactured by DIC Corporation) and a photo-acid-generatingagent (product name: CPI-210S, manufactured by San-Apro Ltd.) in PGMEAonto the PET film and drying it. The dry film 2 on the supporting member1 was 6 μm thick after being dried.

Next, as illustrated in FIG. 2C, the dry film 2 was transferred to thesubstrate 4 having the hole 14. The transfer was done with a roll-typelaminator (product name: VTM-200, manufactured by Takatori Corporation)under the conditions where the temperature of the dry film 2 was 120° C.and the magnitude of pressure applied in the direction of the substrate4 was 0.4 MPa. After the transfer, the dry film 2 was 6 μm thick in theregion (B) including a portion sinking in the hole 14, and 5 μm thick inthe region (C) above the substrate 4. The dry film 2 was in contact withthe wall surface 14′. In the direction perpendicular to the surface ofthe substrate 4, the dry film 2 entered the hole 14 by 1 μm from thesurface of the substrate 4. With the dry film 2 being in contact withthe wall surface 14′, the supporting member 1 was peeled off the dryfilm 2 in an environment of 25° C.

Next, as illustrated in FIG. 2D, with the dry film 2 being in contactwith the wall surface 14′, the dry film 2 was exposed to 5000 J/m² lighthaving an exposure wavelength of 365 nm through the mask 6 using anexposure device (product name: FPA-3000i5+, manufactured by CANONKABUSHIKI KAISHA). Then, baking was performed at 50° C. for five minutesto form a latent image on the dry film 2 such that the exposed region 8in the dry film 2 became part of the flow-passage forming member 16 andthe non-exposed region 7 in the dry film 2 became the liquid flowpassages 10. The dry film 2 was exposed to light above the hole 14 so asto leave part of the dry film 2.

Next, as illustrated in FIG. 2E, the member 9 on the supporting member1, which is a PET film, was transferred onto the dry film 2 with aroll-type laminator. A dry film (second dry film) was used as the member9. The second dry film was formed by applying a coating liquidcontaining an epoxy resin (product name: 157S70, manufactured byMitsubishi Chemical Corporation), a photo-acid-generating agent (productname: LW-S1, manufactured by San-Apro Ltd.), and a solvent (PGMEA) ontothe PET film and drying it. The photosensitivity of the second dry filmwas different from that of the dry film 2 (first dry film), and wasthree or more times that of the first dry film.

Next, as illustrated in FIG. 2F, the second dry film was exposed to 1000J/m² light having an exposure wavelength of 365 nm through the mask 6using the exposure device (product name: FPA-3000i5+, manufactured byCANON KABUSHIKI KAISHA). Then, baking was performed at 90° C. for fiveminutes to form a latent image on the second dry film such that theexposed region 8 in the second dry film became a member for forming theliquid discharge ports 13 and the non-exposed region 7 in the second dryfilm became the liquid discharge ports 13.

Next, as illustrated in FIG. 2G, development was performed by immersingthe dry film 2 and the member 9 in PGMEA serving as a developingsolution. The liquid flow passages 10 and the liquid discharge ports 13were thus obtained. The liquid flow passages 10 were defined by themember 11 formed by the dry film 2. The liquid discharge ports 13 weredefined by the member 19 formed by the member 9. The wall 12 extendedfrom the member 19 to the side of the hole 14. The wall 12, which is awall of the liquid flow passages 10, was formed by a remaining portionof the dry film 2 above the hole 14. The member 11 and the member 19formed the flow-passage forming member 16.

Last, electrical connections were made to form a liquid discharge head.In this liquid discharge head, an end portion of the wall 12 extendedbeyond (below) the surface of the substrate 4 to be located in the hole14. No deformation of the liquid flow passages 10 was observed.

Example 2

A liquid discharge head was manufactured as illustrated in FIGS. 3A to3E. First, the steps illustrated in FIGS. 2A to 2C were performed inbasically the same manner as in Example 1. In Example 2, however, a dryfilm 17 made of positive photosensitive resin (product name: ODUR,manufactured by Tokyo Ohka Kogyo Co., Ltd.) was used, instead of the dryfilm 2 used in Example 1. The dry film 17 was 6 μm thick in a regionincluding a portion sinking in the hole 14, and 5 μm thick in a regionabove the substrate 4. The dry film 17 was in contact with the wallsurface 14′. In the direction perpendicular to the surface of thesubstrate 4, the dry film 17 entered the hole 14 by 1 μm from thesurface of the substrate 4. With the dry film 17 being in contact withthe wall surface 14′, the supporting member 1 was peeled off the dryfilm 17 in an environment of 25° C.

Next, as illustrated in FIG. 3A, the dry film 17 was exposed to 5000J/m² light having an exposure wavelength of 365 nm through the mask 6using an exposure device (product name: FPA-3000i5+, manufactured byCANON KABUSHIKI KAISHA).

Next, as illustrated in FIG. 3B, with the dry film 17 being in contactwith the wall surface 14′, the dry film 17 was developed with methylisobutyl ketone. Since the dry film 17 made of positive photosensitiveresin was used, the exposed region 8 was removed by the development. Thedry film 17 remaining after the patterning was used as a mold member forforming the liquid flow passages 10. The mold member was formed abovethe hole 14. A part of the mold member was removed to create a space.

Next, as illustrated in FIG. 3C, a coating layer 18 was formed by anepoxy resin (product name: EHPE-3150, manufactured by DaicelCorporation) and a negative photosensitive resin containing xylene. Thecoating layer 18 was formed by spin coating to cover the dry film 17.The space created by removing part of the mold member was filled withthe coating layer 18.

Next, as illustrated in FIG. 3D, the coating layer 18 was exposed to4000 J/m² light having an exposure wavelength of 365 nm through the mask6 using the exposure device (product name: FPA-3000i5+, manufactured byCANON KABUSHIKI KAISHA). Then, baking was performed at 90° C. for fiveminutes to form a latent image on the coating layer 18 such that theexposed region 8 in the coating layer 18 became a member for forming theliquid discharge ports 13 and the non-exposed region 7 in the coatinglayer 18 became the liquid discharge ports 13.

Next, as illustrated in FIG. 3E, the liquid discharge ports 13 wereformed by paddle development of 60 seconds with a liquid mixture ofmethyl isobutyl ketone and xylene. Then, the liquid flow passages 10were formed by immersion in methyl lactate for 60 seconds. Theflow-passage forming member 16 was thus obtained. The wall 12 extendedfrom the flow-passage forming member 16 to the hole 14. The wall 12,which is a wall of the liquid flow passages 10, was formed by a portionof the coating layer 18 filling the space created by removing a part ofthe dry film 17 above the hole 14.

Last, electrical connections were made to form a liquid discharge head.In this liquid discharge head, an end portion of the wall 12 extendedbeyond the surface of the substrate 4 to be located in the hole 14. Nodeformation of the liquid flow passages 10 was observed.

Example 3

First, as illustrated in FIG. 4A, the substrate 4 was prepared, whichhas the energy generating elements 5 made of TaSiN on the first surface.A silicon (100) substrate was used as the substrate 4. The substrate 4has the protective film 3 made of SiN. The hole 14 to serve as a liquidsupply port was formed in the substrate 4 with Reactive Ion Etching(RIE).

Next, as illustrated in FIG. 4B, the supporting member 1 and the dryfilm 2 supported by the supporting member 1 were prepared. A PET filmwas used as the supporting member 1. The dry film 2 was formed byapplying a solution obtained by dissolving an epoxy resin (product name:N-695, manufactured by DIC Corporation) and a photo-acid-generatingagent (product name: CPI-210S, manufactured by San-Apro Ltd.) in PGMEAonto the PET film and drying it in an oven at 100° C. The dry film 2 onthe supporting member 1 was 20 μm thick after being dried.

Next, as illustrated in FIG. 4C, the dry film 2 was transferred to thesubstrate 4 having the hole 14. The transfer was done with a roll-typelaminator (product name: VTM-200, manufactured by Takatori Corporation)under the conditions where the temperature of the dry film 2 was 120° C.and the magnitude of pressure applied in the direction of the substrate4 was 0.4 MPa. After the transfer, the dry film 2 was 20 μm thick in theregion (B) including a portion sinking in the hole 14, and 17 μm thickin the region (C) above the substrate 4. The dry film 2 was in contactwith the wall surface 14′. In the direction perpendicular to the surfaceof the substrate 4, the dry film 2 entered the hole 14 by 3 μm from thesurface of the substrate 4. With the dry film 2 being in contact withthe wall surface 14′, the supporting member 1 was peeled off the dryfilm 2 in an environment of 25° C.

Next, as illustrated in FIG. 4D, with the dry film 2 being in contactwith the wall surface 14′, the dry film 2 was exposed to 5000 J/m² lighthaving an exposure wavelength of 365 nm through the mask 6 using anexposure device (product name: FPA-3000i5+, manufactured by CANONKABUSHIKI KAISHA). Then, baking was performed at 50° C. for fiveminutes. Thus, a portion covering the opening of the hole 14 becomes theexposed region 8. Then, development was performed with PGMEA to removethe non-exposed region 7.

Next, as illustrated in FIG. 4E, the member 9 was formed on theremaining region of the dry film 2, that is, on the exposed region 8 inthis example. The member 9 was formed in the following manner. First, asolution obtained by dissolving an epoxy resin (product name: N-695,manufactured by DIC Corporation) and a photo-acid-generating agent(product name: CPI-210S, manufactured by San-Apro Ltd.) in PGMEA wasapplied onto a PET film. The applied solution was dried in an oven at100° C. and transferred by lamination to the dry film 2 at a temperatureof 120° C. and a pressure of 0.4 MPa. Then, the member 9 was obtained bypeeling off the PET film. The member 9 was 5 μm thick.

Next, as illustrated in FIG. 4F, the member 9 was exposed to 5000 J/m²light having an exposure wavelength of 365 nm through the mask 6 usingthe exposure device (product name: FPA-3000i5+, manufactured by CANONKABUSHIKI KAISHA). The exposed region 8 and the non-exposed region 7were formed in the member 9. Then, baking was performed at 50° C. forfive minutes.

Next, in the same manner as that for the dry film 2 illustrated in FIG.4B, a member for forming the liquid discharge ports 13 was produced. Asillustrated in FIG. 4G, the resulting member was transferred to themember 9 with a roll-type laminator to form a region for forming theliquid discharge ports 13. The member for forming the liquid dischargeports 13 was produced by applying a solution obtained by dissolving anepoxy resin (product name: 157S70, manufactured by Mitsubishi ChemicalCorporation) and a photo-acid-generating agent (product name: LW-S1,manufactured by San-Apro Ltd.) in PGMEA onto a PET film using a slitcoating technique and drying the applied solution. The sensitivity ofthe dry film 2 was different from that of the member for forming theliquid discharge ports 13. The member for forming the liquid dischargeports 13 was exposed to 1000 J/m² light having an exposure wavelength of365 nm through the mask 6 using the exposure device (product name:FPA-3000i5+, manufactured by CANON KABUSHIKI KAISHA). Then, baking wasperformed at 90° C. for five minutes to form a latent image for formingthe liquid discharge ports 13.

Next, as illustrated in FIG. 4H, development was performed by immersionin PGMEA to form the liquid flow passages 10 and the liquid dischargeports 13.

Last, electrical connections were made to form a liquid discharge head.In this liquid discharge head, the substrate 4 was protected at theopening of the hole 14 by the protective film 20 formed by the dry film2. No deformation of the liquid flow passages 10 was observed.

While the present invention has been described with reference toexemplary embodiments, it is to be understood that the invention is notlimited to the disclosed exemplary embodiments. The scope of thefollowing claims is to be accorded the broadest interpretation so as toencompass all such modifications and equivalent structures andfunctions.

What is claimed is:
 1. A method for manufacturing a liquid dischargehead, the method comprising: a putting step of putting, on a substratehaving a hole, a dry film supported by a supporting member to close thehole, and a peeling step of peeling the supporting member off the dryfilm on the substrate, wherein the peeling step is performed in a statein which the dry film is in contact with a wall surface defining thehole in the substrate and in a state in which the dry film is embeddedin a part of the hole.
 2. The method according to claim 1, wherein inthe putting step the dry film is brought into contact with the wallsurface by applying pressure in the direction of the substrate while thedry film is in contact with the substrate.
 3. The method according toclaim 2, wherein the application of the pressure for the dry film isdone by roll-type transfer or by transfer under vacuum.
 4. The methodaccording to claim 1, wherein in the putting step the dry film is heatedwhile being in contact with the substrate.
 5. The method according toclaim 4, wherein a temperature for heating the dry film is higher than asoftening point of the dry film.
 6. The method according to claim 1,wherein when the dry film is in contact with the wall surface definingthe hole in the substrate, a thickness of the dry film, in a directionperpendicular to a surface of the substrate, is greater above the holethan above the substrate.
 7. The method according to claim 1, wherein ina direction perpendicular to a surface of the substrate, the dry film isfrom 5 μm to 30 μm thick above the hole.
 8. The method according toclaim 1, wherein in a direction perpendicular to a surface of thesubstrate, the dry film is from 3 μm to 25 μm thick above the substrate.9. The method according to claim 1, wherein the dry film is made of aphotosensitive resin.
 10. The method according to claim 1, wherein thedry film forms a flow-passage forming member for forming liquid flowpassages.
 11. The method according to claim 1, wherein the dry filmforms a mold member for forming liquid flow passages.
 12. The methodaccording to claim 1, wherein further processing is performed such thata part of the dry film is left above the hole, and a remaining part ofthe dry film forms a wall of liquid flow passages.
 13. The methodaccording to claim 1, wherein as a result of further processing the dryfilm is formed into a film extending from a surface of the substrate tothe wall surface defining the hole.
 14. The method according to claim13, wherein by patterning the dry film after bringing the dry film intocontact with the wall surface defining the hole in the substrate, thefilm extending from the surface of the substrate to the wall surface isobtained.
 15. The method according to claim 13, wherein the dry film issupported by the supporting member before being putted to the surface ofthe substrate, and the supporting member is peeled off the dry filmafter the dry film is putted to the surface of the substrate.
 16. Themethod according to claim 13, wherein the dry film forms a filter forthe hole.
 17. The method according to claim 1, wherein the length of apart of the dry film which is in the hole is 25 μm or less.
 18. Themethod according to claim 1, wherein the length of a part of the dryfilm which is in the hole is 20 μm or less.
 19. The method according toclaim 1, wherein the length of a part of the dry film which is in thehole is 2 μm or more.
 20. The method according to claim 1, wherein thehole extends in a direction perpendicular to a surface of the substrateon which the dry film supported by the supporting member is put.